Electrodeposition of transparent tungsten oxide film as a potential electron-transportlayer in optoelectronic devices
سال انتشار: 1403
نوع سند: مقاله کنفرانسی
زبان: انگلیسی
مشاهده: 134
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شناسه ملی سند علمی:
NICEC22_475
تاریخ نمایه سازی: 7 مرداد 1403
چکیده مقاله:
Electrochemical deposition is one of the available, cheap, and precise techniques to prepare a thin filmof tungsten oxide (WO۳) with promising properties as an electron-transport layer (ETL) in optoelectronic devices.In the current study, electrodeposited WO۳ photoelectrode has been successfully synthesized, optimized, andcharacterized using techniques such as XRD and UV-Vis. The transparent WO۳ layer is aimed to show perfectperformance in optoelectronic devices
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نویسندگان
m Mohebbi
Department of Chemistry, Catalysis Division, University of Isfahan, Isfahan ۸۱۷۴۶-۷۳۴۴۱, Iran.
f Sadegh
Department of Chemistry, Catalysis Division, University of Isfahan, Isfahan ۸۱۷۴۶-۷۳۴۴۱, Iran.
v Mirkhani
Department of Chemistry, Catalysis Division, University of Isfahan, Isfahan ۸۱۷۴۶-۷۳۴۴۱, Iran.
m Moghadam
Department of Chemistry, Catalysis Division, University of Isfahan, Isfahan ۸۱۷۴۶-۷۳۴۴۱, Iran.
s Tangestaninejad
Department of Chemistry, Catalysis Division, University of Isfahan, Isfahan ۸۱۷۴۶-۷۳۴۴۱, Iran.
I. Mohammadpoor-Baltork
Department of Chemistry, Catalysis Division, University of Isfahan, Isfahan ۸۱۷۴۶-۷۳۴۴۱, Iran.