Large-Scale Micro/Nanoscale Patterns and Complex Three-Dimensional Structures, as Well as High Aspect Ratio Features

 Large-Scale Micro/Nanoscale Patterns and Complex Three-Dimensional Structures, as Well as High Aspect Ratio Features

In addition, a variety of current nanopatterning technologies, such as electron beam lithography, optical lithography, interference lithography (IL), etc., cannot cope with all the practical demands of industrial applications in terms of high resolution, high throughput, low cost, large area and patterns on non-flat and curved surfaces.  Therefore, new high-volume nanofabrication technology is in urgent need of exploitation and development to meet the extraordinary needs of the growing markets. Nanoelectronic lithography is currently considered as a promising nanopatterning method with low cost, high throughput and high resolution, especially for the production of large-scale micro/nanoscale patterns and complex three-dimensional structures, as well as high aspect ratio features  . Due to these outstanding advantages, the transformation of optical structures in combination with large-area fabrication becomes a more effective method in this field.

In general, the electrical, optical, magnetic, surface, etc. properties of these three structures are fundamentally different from each other, and consequently their applications are also different. One-dimensional nanostructures can be used for electronic connections, while there is no such application for zero-dimensional and two-dimensional nanomaterials.

Materials that are nanometer-sized in all three dimensions and have no dimensions of freedom. According to some classifications, this class of nanostructures  is also called nanoparticles. The factors affecting the properties of nanoparticles are the size and type of particles.