Interferential Nanolithography (IL) and Nano-Opto-Electronics

Note: The ability to produce large micro- and nanostructures on non-planar surfaces is important for many applications such as optics, optoelectronics, nanophotonics, imaging technology, NEMS, and microfluidics.

However, it is very difficult to create large nanostructures on curved or non-planar surfaces using existing patterning methods. Furthermore, a variety of current nanopatterning technologies, such as electron beam lithography, optical lithography, interference lithography (IL), etc., cannot meet all the practical demands of industrial applications in terms of high resolution. High power, low cost cope. , large area and patterns on non-flat and curved surface. Therefore, new high-volume nano-manufacturing technology urgently needs to be exploited and developed to meet the extraordinary needs of growing markets.Lithography Nanoelectronics is currently considered as a promising low-cost, high-throughput, and high-resolution nanopatterning method, especially for the production of large-scale small/nanopatterns and complex 3D structures, as well as the aspect The above characteristics of the ratio  have also given rise to these prominent advantages. This field becomes Especially, nanoelectronic lithography has great potential to set new standards for making miniature, low-cost and light-weight optics that can be used in many fields of applications.

To better understand the relationship between the optical, electronic, magnetic and catalytic properties of nanoparticles and their structure, well-defined model systems are needed. Chemical synthesis of metal nanoparticles leads to dispersion of large size and shape and lack of lateral order. In contrast, conventional lithography methods provide top-down control of lateral order and dimensions. However, they are either limited in resolution or have low power and thus enable the large area of ​​patterning required to obtain a suitable signal-to-noise ratio in conventional analytical and descriptive techniques. they do not. Extreme ultraviolet (EUV) lithography has the advantages of efficiency and simplicity of photolithography, as well as high resolution due to wavelength.

Conclusion :

The ability to produce large-scale micro- and nanostructures on non-planar surfaces is important for many applications such as optics, optoelectronics, nanophotonics, imaging technology, NEMS, and microfluidics.