Nanostructure study of electrodeposited Co-Cu/Cu multilayer films in presence of KCl

Electrodeposited Co-Cu/Cu multilayers were potentiostatically prepared from a sulphate bath with and without KCl as an additive. The cyclic voltagram (CV) curves of the electrolyte for both cases were depicted and analyzed. The nanostructure of the deposits was studied by X-ray diffractometer (XRD) and scanning electron microscope (SEM). The XRD and SEM results showed that the grain size of the deposits and the degree of orientations decreases with increase of KCl. Thus it has been concluded that the adsorption of chloride, the formation of copper (I) intermediate, the change in the deposition mechanism, and the increase in nucleation rate all contribute to enhancement of a structural disorder.

کلیدواژه ها:

Electrodeposition ، Co-Cu/Cu ، multilayer ، SEM ، XRD