Nucleation, Growth, and Characterization of MnO2 Thin Films deposited by anElectrochemical Process on ITO

Recent advances in the field of solar cell have led to renewed interest thin films deposited on ITO.Types of thin films such as Cu2ZnSnS4[1], Zno/Zno/grapheme[2], Nis[3] and …were applied insolar cell. The metal oxide thin films are an important group of the nanostructured materials. Thenano materials of thin films can be synthesized and grown by different techniques [4]. In this study,the substrates applied were ITO-coated glasses with a manganese dioxide nanostructures film wereprepared by an electrochemical method. The electro deposition were performed by constant currentmode with a current density of 10 mA⁄cm2 at lab temperature as two electrode at 1, 2:50, 5 and 60min. Roughness of the thin films has been characterized by Atomic force microscopy (AFM). Theabsorption spectra of Mno2 films with varying thicknesses were obtained between 300 and 1100 nmat room temperature with using UV-Vis spectrophotometer. The AFM images showed that theMnO2 nanostructures growth mode is island and also, increase in the deposition time caused adecrease in the roughness average of the films surface. The absorption spectra of deposited filmswere increased by increase in the deposition time.

کلیدواژه ها:

MnO2 thin film ، electrochemical process ، Nucleation ، Growth