Effect of argon atmospheric cold plasma on ITO surface behavior and construction of single and multi-layer diodes based on it
سال انتشار: 1396
نوع سند: مقاله کنفرانسی
زبان: انگلیسی
مشاهده: 393
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شناسه ملی سند علمی:
SECONF01_002
تاریخ نمایه سازی: 29 مهر 1396
چکیده مقاله:
Transparent Conductive Oxide (TCO) layers due to transparency, high conductivity, hole injection capability and widely used have attracted a lot of attention in. One of these layers is Indium Tin Oxide (ITO). ITO due to low resistance,transparency in the visible spectrum and its proper work function is in the manufacture of organic lightemitting diodes and solar cells. One way for improving the ITO surface is plasma treatment. Inthis paper, changes in surface morphology, byapplying argon atmospheric pressure cold plasma,was studied through Atomic Force Microscopic (AFM) image analysis and Fourier TransformInfrared Spectroscopy (FTIR) is analyze. FTIR analysis showed functional groups were not added or removed, but chemical bond angle and bonds power on the surface changed and also AFMimages showed that surface roughness increased. These factors lead to the production of diode which they have a better ohmic contact and injection which are more application.
کلیدواژه ها:
ITO ، argon atmospheric pressure cold plasma ، Organic Light Emitting Diode (OLED) ، single-layer ، multi-surface ، hole injection
نویسندگان
Sakineh Akbari Nia
Nano-optoelectronics laboratory, Sheykh Bahaee research complex, science and research branch, Islamic Azad University, Tehran, I.R. Iran Nano-optoelectronics group, physics department, science and research branch, Islamic Azad University, Tehran, I.R. Ira
Yousef Seyed Jalili
Nano-optoelectronics laboratory, Sheykh Bahaee research complex, science and research branch, Islamic Azad University, Tehran, I.R. Iran Nano-optoelectronics group, physics department, science and research branch, Islamic Azad University, Tehran, I.R. Ira