A Review on Titanium Nitride and Titanium Carbide Single and Multilayer Coatings Deposited by Plasma Assisted Chemical Vapor Deposition
محل انتشار: ماهنامه بین المللی مهندسی، دوره: 29، شماره: 5
سال انتشار: 1395
نوع سند: مقاله ژورنالی
زبان: انگلیسی
مشاهده: 507
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شناسه ملی سند علمی:
JR_IJE-29-5_012
تاریخ نمایه سازی: 12 دی 1395
چکیده مقاله:
In this paper, we reviewed researches about the titanium nitride (TiN) and titanium carbide (TiC) single and multilayer coatings. These coatings were deposited by the plasma assisted chemical vapor deposition (PACVD) technique. Plasma-based technologies are used for the processing of thin films and coatings for different applications such as automobile and aerospace parts, computer disc drives, food industry and surgical/medical instruments. We describe the state of the performance of different coating systems and thin film architectures in PACVD suitable for industrial-scale or laboratory applications. Mechanical properties of coatings such as wear resistance, hardness and the scratch resistance, structural characteristics, physical and chemical properties like coatings adhesion into different substrates, wetting behavior and corrosion resistance were studied. Thus, this paper represents a source of information for those who want to familiarize with the status of knowledge in the area of materials science of functional coatings, in particular TiN/TiC coatings that was deposited by a new Plasma-based technologies.
کلیدواژه ها:
Titanium NitrideTitanium CarbideMultilayer CoatingsHard CoatingsPlasma Assisted Chemical Vapor Deposition
نویسندگان
M Azadi
Faculty of metallurgical Engineering and material, Semnan University, Semnan, Iran
A Sabour Ruhaghdam
Faculty of Engineering, Materials Engineering Department, Surface Engineering Laboratory ,Tarbiat Modares University, Tehran, Iran
S Ahangarani
Advanced Materials and Renewable Energies Department, Iranian Research Organization for Science and Technology, Tehran, Iran