Thermal Radiative Properties of Nanoscale Multilayer Structures

Radiative properties of a material are the core of thermal science and optics, which play critical roles in modern technologies, including MEMS/NEMS. The radiative properties, such as reflectance, transmittance, and emittance of multilayer structures largely depend on the direction and wavelength of incident radiation as well as wafer temperature. They are also affected by thin-film coatings and surface roughness[1].The studied examples using silicon wafer and either silicon dioxide or silicon nitride coating demonstrate the strong influence of coating and coating thickness on the radiative properties. This study helps gain a better understanding of the radiative properties of semitransparent wafers with different coatings and will have an impact not only on semiconductor processing but also on thin film solar cells. Fu studied radiative properties of NIMs by using three multilayer structures with NIM layer [1]. We have interested in studying nanoscale radiative properties with silicon because silicon is the most extensively used material in MEMS/NEMS