persistent hydrophilictiy for TiO3 thin films by SiO2 over nanolayers

SiO2 thin layers thicknesses 1,5,10,18nm on TiO2 thin layer in thickness 79 nm deposited by reactive RF sputtering techniqud. The deposited films heat treated at temperatures 200,400,500,660 c . The surface properties of thin films by atomic force micrpscopy AFM, surface chemical compositon self clening effect in bi layers, were studied. in addition, enhanced of hydrophilictiy proerty in the film in effect of annealed temperratue and persistence wihout UV light illumination were evaluate.