Deposition temperature effects on microstructure of Te thin films

In this work, effect of deposition temperature on the microstructure of tellurium thin films has been studied. Tellurium thin films with different deposition temperatures have been deposited on Al.O substrate by thermal evaporation. X-ray diffraction (XRD) analysis and scanning electron microscope (SEM) are used for characterizing the prepared samples. XRD patterns indicate that as deposition temperature increases, the crystallinity of the films increases. SEM micrographs show that the grain size increases with deposition temperature increase, and consequently, fewer defects are found in the surface of the film.

کلیدواژه ها:

Tellurium ، thin films ، XRD ، SEM