Electrophoretic Deposition of Graphene film on Copper

Graphene, an outstanding carbon-based material, has gained significant attention due to its exceptional mechanical, electrical, and thermal properties. With its high surface-to-weight ratio and unique two-dimensional structure, graphene is widely used in energy storage, anti-corrosion coatings, and the electronics industry. This study explores electrophoretic deposition (EPD) as an efficient, simple, and cost-effective method for depositing graphene coatings onto copper substrates. EPD enables the formation of uniform and stable graphene films without the need for high temperatures. Scanning electron microscopy (SEM) and Raman spectroscopy were employed to assess the quality, thickness, and uniformity of the coatings. The results demonstrate that key deposition parameters, such as time and voltage, significantly influence the structure, density, and thickness of the graphene films. These findings contribute to the development of corrosion-resistant coatings, enhanced electrical conductivity, and other applications in nanotechnology and electronics.

کلیدواژه ها:

Coating ، Electrophoretic Deposition ، Graphene Film ، Graphene