Effect of anode shape of the plasma focus device on the deposition of the copper thin film on glass substrate

In this paper studied the effects of the anode shape on quantity of CuO thin films were deposited onto glasssubstrates at room temperature by a plasma focus devise (PFD). The deposition was performed by usingMather type (PFD) ۵.۴ kJ energy. The glass substrate placed on ۱۵cm above the anode tip on the (PFD)chamber. Deposition have carried out by three shots of (PFD) for each substrate In the presence of argon gas.X-ray diffraction (XRD) results suggested that the deposited CuO films were formed by nanoparticles withaverage particle size in the range of (۸-۱۹) nm. For characteristics analyze of the thin film Samples, surfacesof the samples scanned . Images processed by using MATLAB image processing toolbox. The resultsshowed in the case of conical anode shape, the best deposition of thin film performed was obtained in the.

کلیدواژه ها:

Plasma focus device ، Copper thin film ، Glass substrate ، Anode shape