Cold Wall C hemical V apour D eposition Reactor Design for Synthesis of Carb on Nanotubes: Parametric Study

Chemical vapour deposition (CVD) is one of the most popular used techniques fo r the production of nan oparticles [۱]. In this work, resul ts are reported on parametric modelling appro ach to synt hesize multi -walled carbon nanotubes (MWC Ns) using a cold wall CVD reactor. Effects o f substrate temperature, rotating dis k velocity and inlet gas composition on averag e growth rate of carbon nanotubes were investigated.Meth ods:The process gases Xylene (C۸H۱۰) and Hy drogen (H۲ ) and the ca rrier gas Arg on (Ar) enter the reactor at ۳۱۰ K. Laminar flow and low pressure con ditions are necessary to synthesize CVD products of better quality. T he carbon solid deposition rate i s governed by a mixtu re of volumetric and wall surface reactions. Th e mixture velocity at th e inlet is ۰.۰۲۲ m/s. Th e top wall is heated to ۲۰۰ºC and side walls of the reactor are maintained at ۷۰ºC. This can be a representative of a cold wall reactor in wh ich only the substrate is heated to high temperatures, while the remaining reactor walls are m aintained at low temperatures. Figure۱ demonstrates the sc hematic of t he CVD rea ctor configuration.

کلیدواژه ها:

Nano Material ، C hemical Vap or Depositi on ، Cold Wa ll ، Carbon Nanotubes.