Electrophoretic deposition technique for coating nano TiO۲ on SS۳۱۶L alloy.

bstract: - The aim of this work was to use the electrophoretic deposition (EPD) technique for the deposition of nano-TiO۲ layers directly on an SS۳۱۶L substrate. The nano-TiO۲ films were deposited on an SS۳۱۶L alloy with various parameters, such as potential, time of deposition and annealed temperature—the optimum parameters required for the development of stable nano-TiO۲ layer coating. The results obtained from the X-ray diffraction (XRD) and FESEM tests in this study showed that the TiO۲ layers sintered at ۴۰۰ °C were amorphous. The XRD patterns showed the anatase phase at ۶۰۰ °C for ۱ h. The heat treatment of TiO۲ layers led to good adhesion with the SS۳۱۶L alloy. The heat treatment above ۵۰۰ °C led to the agglomeration of nano-TiO۲ layers from ۲۸ nm to ۷۸ nm at ۶۰۰ °C. The thickness of the nano-TiO۲ coating increased with the deposition time and potential. The optimum thickness of the nano-TiO۲ coating on the SS۳۱۶L alloy was ۵۰ µm at ۵ min and ۳۰ V. The increase in coating thickness with the time and potential of deposition led to problems, including increases in roughness and weak adhesion of the coating layer.

کلیدواژه ها:

electrophoretic deposition ، Titanium dioxide ، SS۳۱۶L