Nitrogen doped nanostructure titanium dioxide thin film: photocatalytic property and structure

Nitrogen doped TiO2 thin film was deposited by a DC reactive magnetron sputtering on glass and SiO substrate and then annealed at 400° C. Deposition was performed at Ar + O2+N2 gas mixture with a pressure of 1.0 Pa and oxygen and nitrogen with a constant pressure of 0.2 Pa and 0.1 Pa, respectively. The pure TiO2 thin film was deposited at Ar+O2 gas mixture with a pressure of 1.0 Pa and oxygen with a constant pressure of 0.2 Pa. ZnO thin layer was used as a buffer layer. The thicknesses of layers TiO2-x)Nx /TiO2/ZnO were approximately 200nm, 800nm, and 80 nm, respectively. The structure and the morphology of deposited films were evaluated by x-ray diffraction (XRD) and scanning electron microscopy (SEM). The average grain size of TiO2 nanocrystals was in the range of 25-30 nm in the annealed fabricated thin films. The microstructure of annealed films was anatase. The transmittance of the films was measured using ultraviolet–visible light ( UV–vis) pectrophotometer.Photocatalytic activity of the samples was evaluated by the degradation of Methylene Blue (MB) dye.

کلیدواژه ها:

Nitrogen doped TiO2 thin films ، sputtering ، structure ، photocatalytic activity