The Effect of SiO2 Concentration, Annealing Temperature, Thickness Violet (UV) Light on the Wettability of TiO2 and TiO2 – SiO2 Nanost Coatings Prepared by Dip-Coating Method

  • سال انتشار: 1387
  • محل انتشار: دومین کنگره بین المللی علوم و فناوری نانو
  • کد COI اختصاصی: ICNN02_629
  • زبان مقاله: انگلیسی
  • تعداد مشاهده: 966
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نویسندگان

s Rahmanseresht

Department of Physics, Sharif University of Technology Tehran, Iran;

n Taghavinia

Department of Physics, Sharif University of Technology Tehran, Iran

n Nekoui

Department of Mechanical Eng., AmirKabir University of Technology , Tehran, Iran

چکیده

Titanium Dioxide (TiO2) thin films because of its photo catalytic effect is one of the m investigated cases in the field of coatings. The self cleaning surfaces are one of the most famou of these coatings [1]. Having improved the properties of this film, particularly its photo c investigations focusing on using other materials such as Si, Ag, Ce, … besides the TiO2 hav Also it has been found that UV illumination of TiO2 materials can produce a highlysurface which plays a significant role in self cleaning properties [2]. Research has been c TiO2 to improve it’s self-cleaning property and preparing films which can keep thei property even under weak UV illumination. This superhydrophilic property makes T promising materials for self-cleaning coatings. In this research after preparing TiO2 an coatings on glass by dip-coating method, surface wettability of the samples were evaluated by angle measurements. The effect of different parameters such as annealing temperature, thickne (number of layers), concentration of SiO2 in TiO2-SiO2 thin films and the role of Ultra Violet this property were investigated

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