St atistical p roperties of Plasm a Enhance d Chemic al Vapor Deposition na noparticles

سال انتشار: 1391
محل انتشار: پانزدهمین سمینار شیمی فیزیک ایران
کد COI اختصاصی: ISPTC15_0898
زبان مقاله: انگلیسی
تعداد مشاهده: 171

نویسندگان

D epartment of physics, Faculty of sciences, Islamic Azad U niversity, Tehran Central Branch, Tehran, Iran

چکیده

Chemical Vapor Deposition (CVD) proce ss is an imp ortant method to fabricate uniform layer with low-porosity, high-purity, high-performance and local deposition. The process is often used to produce n anothin fil ms and nan oparticles. I t will be very useful an d practical if we could produce na noparticles with the desired size. A number of forms of CVD`s are in wide use an d are frequently referenced in the literatures. These processes differ in the means by which chemical reactions ar e initiated (e.g., activation process) and process conditio ns. In semiconductor te chnology three methods are us ed for th e deposition of layers on semiconductor wafers[۱,۲]:۱ -APCVD. Atmospheric Pressure Chemical V apor Deposition requires rather high tempera tures.۲-LPC VD.low Pressure Chemical Vapo r Deposition. ۳-PECVD. Plasma Enhanced Chemical Vapor Deposition. Th e necessary energy for the chemical reaction is not introduced by he ating the whole reaction chamber b ut just by h eated gas or plasma. The properties of the coated layers can be better i nfluenced w ith PECVD than in simple thermal deposition technique, b ecause more process parameters can be varied.Fractal dimension (FD) is a u seful feature for texture segmentation, shape c lassification , and graphic analysis in many fields. The bo x-counting approach is one of the frequently used techniques to estimate the FD of an ima ge. Fractal g eometry pr ovides a mathematical model for m any comple x objects found in nature [۳–۵], such as coastlines, mountains, and clouds.

کلیدواژه ها

Chem ical Vapor Deposition, Statistical properties, F ractal dimension, nanoparticles

مقالات مرتبط جدید

اطلاعات بیشتر در مورد COI

COI مخفف عبارت CIVILICA Object Identifier به معنی شناسه سیویلیکا برای اسناد است. COI کدی است که مطابق محل انتشار، به مقالات کنفرانسها و ژورنالهای داخل کشور به هنگام نمایه سازی بر روی پایگاه استنادی سیویلیکا اختصاص می یابد.

کد COI به مفهوم کد ملی اسناد نمایه شده در سیویلیکا است و کدی یکتا و ثابت است و به همین دلیل همواره قابلیت استناد و پیگیری دارد.