An Optimum magnetic field in Cu thin films production of DC magnetron sputtering

Cu film has been deposited by direct current (DC) magnetron sputtering on glass substrates under different deposition conditions. The effect of magnetic field on production of Cupper thin films have been studied so that Cu films were deposited on glass substrates without heating by DC magnetron sputtering in pure Argon gas. The coil current has increased from 2A to 9A. Additionally, X-Ray diffraction, Spectrophotometer, RBS and Atomic Force Microscopy were employed to observe the structural characterization of the films. The results show that there is an optimum magnetic field for the maximum sputtering rate and Surface properties could be affected by this experiment dramatically.

کلیدواژه ها:

DC magnetron sputtering ، Roughness ، Annealing ، Thickness